ITW MPM – Semiconductor Assembly solution - Momentum II HiE & Elite
The Momentum II HiE and Elite models are precision-driven stencil printers tailored for semiconductor and high-volume electronics assembly. Designed to deliver superior throughput, alignment accuracy, and process consistency, they represent the high-performance end of the Momentum series.
Overview
The Momentum II HiE (High Efficiency) is built with servo motors driving the vision system’s X, Y, and Z axes, offering significantly faster movement compared to traditional stepper motors. This results in improved throughput and reduced cycle time, making it ideal for high-volume environments. The Momentum II Elite is the flagship model of the Momentum line, featuring a highly efficient triple-track rail system with an input buffer, central processing area, and output buffer. It delivers the shortest cycle times and the highest throughput of all models in the series, with industry-leading accuracy and repeatability for demanding semiconductor assembly applications.
Features
- High-Efficiency Motion Control: Servo motors drive the X, Y, and Z axes in the HiE model for faster, smoother vision system movement.
- Triple-Track Rail System (Elite): Includes input, processing, and output zones to enable continuous board flow and peak throughput.
- Optimized for Speed: Designed to minimize cycle time and maximize line efficiency.
- High Alignment Precision: ±11 μm @ 6σ, Cpk ≥2 ensures consistent board placement accuracy.
- Wet Print Accuracy: ±17 μm @ 6σ, Cpk ≥2 delivers high print quality and repeatability.
- 6 Sigma Capability: Independently verified performance built into both models for superior process control.
- Low Defect Rates: Tighter tolerances reduce variability, ensuring repeatable, high-yield results.
- Ideal for Semiconductor & SMT: Engineered for advanced packaging and high-speed electronic assembly lines.
Specifications
- Drive System: HiE uses servo motors for X, Y, Z axis movement; Elite incorporates servo motors with triple-track configuration.
- Rail Design: HiE features a single-rail design; Elite uses a triple-track layout with input, center processing, and output buffers.
- Cycle Time: HiE offers reduced cycle time through high-speed servo operation; Elite delivers the fastest cycle times in the series.
- Alignment Accuracy: ±11 μm @ 6σ, Cpk ≥2 for both models.
- Wet Print Accuracy: ±17 μm @ 6σ, Cpk ≥2 for high consistency.
- Throughput: HiE is optimized for high-volume SMT; Elite achieves maximum throughput in semiconductor applications.
- Performance Validation: Built-in 6 sigma process capability independently verified for both models.
- Application Use: Suitable for semiconductor assembly, fine-pitch electronics, and high-speed production lines.